Purge flow distribution system for a substrate container and method for performing the same

ABSTRACT

A substrate container includes a shell defining an interior space and a purge flow distribution system. The shell includes a front opening, a bottom wall, and a rear wall. The purge flow distribution system receives a stream of purge gas and includes an inlet and a network of separate gas distributing devices configured to distribute the stream of purge gas into the interior space. A supply line is also included that is connected to the inlet and configured to divide the supply of purge gas to the network of separate gas distributing devices. A method of purging an open substrate container includes supplying a stream of purge gas to an inlet of a purge flow distribution system and dividing the purge gas to supply a network of separate gas distributing devices to distribute the stream of purge gas into the interior space.

FIELD

This disclosure generally relates to a substrate container with a frontopening for processing semiconductor devices. More specifically, thisdisclosure relates to a purge gas distribution system for distributingpurge gas to the interior of the substrate container and method forperforming the same.

BACKGROUND

Substrates in the form of wafers can be processed to form semiconductordevices. The wafer substrates, or simply substrates, undergo a series ofprocess steps. Exemplary process steps can include, but are not limitedto, material layer deposition, doping, etching, or chemically orphysically reacting material(s) of the substrate. A substrate containeris used to store and transport the in-process wafers between processsteps within the fabrication facility. During some process steps, thesubstrates are processed by processing equipment within a cleanenvironment (e.g., a clean room). During processing, gasses must beintroduced and removed from the substrate container such as a frontopening unified pods (FOUP), for example during purge processes, thusrequiring that the FOUP have one or more locations at which gas mayenter or leave the FOUP. Substrates can be transferred from thesubstrate container to the processing tool through an equipment frontend module (EFEM). The EFEM generally includes a load port for receivingthe substrate container, a transfer unit, a frame or “mini-environment”,and a fan filter unit used to generate gas flow within the EFEM.

In use, the substrate container is docked on a load port, and the doorof the EFEM is opened. Next, the door is disengaged from the substratecontainer which permits the transfer unit housed within the EFEM toaccess the substrates contained within the substrate container forprocessing. A flow of gas introduced by the fan filter unit flowsthrough the EFEM in a direction from a top of the EFEM to a bottom ofthe EFEM. When the front opening of the substrate container interfaceswith the load port opening of the EFEM some of the gas flowing throughthe EFEM and across the load port opening may be inadvertently directedinto the interior of the container, potentially interfering with thepurging capabilities of the substrate container by temporarily causingan increase in the relative humidity and/or oxygen levels within themicroenvironment of substrate container, which can be undesirable.

SUMMARY

This disclosure is directed to a system for distributing purge gas forwafer or reticle carrying containers such as FOUPs or pods (e.g.,reticle pods) that are used, for example, in semiconductormanufacturing. More specifically, this disclosure is directed to a purgeflow distribution system within a FOUP or reticle pod for distributingthe stream of purge gas into the interior space of the substratecontainer by dividing the stream of purge gas from a common input portto a plurality of discrete input purge ports for supplying a network ofseparate gas distributing devices.

In at least one example embodiment, a substrate container includes ashell defining an interior space, in which the shell includes a frontopening, a first side wall, a second side wall, a rear wall, and abottom wall including a front edge extending between the first side walland the second side wall along the front opening of the shell. Thesubstrate container also includes a purge flow distribution systemconfigured to receive a stream of purge gas, in which the purge flowdistribution system includes an inlet configured to receive the streamof purge gas and a network of separate gas distributing devicesconfigured to distribute the stream of purge gas into the interiorspace. The purge flow distribution system further includes a supply lineconnected to the inlet that is configured to divide the stream of purgegas to the network of separate gas distributing devices. In accordancewith at least one example embodiment, the supply line includes a firstflow path to one of the network of separate gas distributing devices anda second flow path to another of the network of separate gasdistributing devices. In an embodiment, one of the network of gasdistributing devices is a first gas distributing device provided nearerthe rear wall and the another of the network of gas distributing devicesis a second gas distributing device, in which the second gasdistributing device can be provided nearer the front opening, andwherein the first flow path is configured to supply a portion of thestream of purge gas to the first gas distributing device and the secondflow path is configured to supply another portion of the stream of purgegas to the second gas distributing device. It is appreciated that thesecond gas distributing device can also be provided at other locationswithin the interior of the substrate container, e.g., provided at therear or adjacent another gas distributing device, and is not limited tothe above embodiment. In accordance with at least one other exampleembodiment, the purge flow distribution system further includes amanifold base provided on the bottom wall that receives the stream ofpurge gas from the inlet to divide the stream of purge gas to thenetwork of gas distributing device, in which the manifold base can beconfigured to divide the second flow path into at least a left sidesecond flow path and a right side second flow path to supply the portionof the stream of purge gas to the second gas distributing device.

In at least one example embodiment, a method of purging a substratecontainer when having a front opening that is open that includessupplying, via an inlet port disposed in a wall of the substratecontainer, a stream of purge gas to an inlet of a purge flowdistribution system disposed at least partly within the substratecontainer; and dividing, via a supply line of the purge flowdistribution system, the purge gas to supply a network of separate gasdistributing devices for distributing the stream of purge gas into aninterior space of the substrate container, in which the supply linecomprises at least a first flow path to one of the network of gasdistributing devices and at least a second flow path to another of thenetwork of separate gas distributing devices. In an embodiment, themethod further includes setting a first portion of the stream of purgegas to a first gas distributing device via the first flow path andsetting a second portion of the stream of purge gas to a second gasdistributing device via the second flow path.

BRIEF DESCRIPTION OF THE DRAWINGS

Both described and other features, aspects, and advantages of asubstrate container and a method of purging a substrate container willbe better understood with the following drawings:

FIG. 1 is a front prospective view of a substrate container, accordingto at least one example embodiment.

FIG. 2 is an exploded view of a substrate container, according to atleast one example embodiment.

FIGS. 3A-3C are schematic views of a substrate container having a purgeflow distribution system that is configured to divide the supply ofpurge gas, according to different embodiments.

FIG. 4A is a rear prospective view of a substrate container having apurge flow distribution system that is configured to divide the supplyof purge gas, according to at least one example embodiment.

FIG. 4B is a top side sectional view of the substrate container of FIG.4A, according to at least one example embodiment.

FIG. 5A is a rear prospective view of a substrate container having apurge flow distribution system that is configured to divide the supplyof purge gas using a manifold base, according to at least one exampleembodiment.

FIG. 5B is a schematic view of the manifold base of FIG. 5A that isconfigured to divide the supply of purge gas, according to differentembodiments

FIG. 5C is a bottom side view of the substrate container of FIG. 5A,according to at least one example embodiment.

FIG. 6 is a flow diagram for a method of purging a substrate containerthat includes dividing the supply of purge gas to a network of separategas distributing devices, according to at least one example embodiment.

While the disclosure is amenable to various modifications andalternative forms, specifics thereof have been shown by way of examplein the drawings and will be described in detail. It should beunderstood, however, that the intention is not to limit aspects of thedisclosure to the particular illustrative embodiments described. On thecontrary, the intention is to cover all modifications, equivalents, andalternatives falling within the spirit and scope of the disclosure.

DETAILED DESCRIPTION

When used herein the term “network of gas distributing devices” means anetwork that includes a plurality of separate and distinct gasdistributing devices that are connected together by at least one supplyline. The term “gas distributing device” means a device that includes atleast one gas distributing surface, and is the combination of anyplurality of the gas distributing surface(s) that are provided atcertain specific locations in the substrate container, e.g., a front gasdistributing device includes all of the gas distributing surfacesprovided at the front of the substrate container. The term “gasdistributing surface” means the structural part of the gas distributingdevice that distributes a portion of the purge gas from the gasdistributing device into the interior space, in which the gasdistributing device can include multiple gas distributing surfaces. Theterm “supply line” means the piping, tubing, plumbing that is connectedto the inlet port that receives the purge gas and is used to divide andsupply the purge gas to the input purge port(s) for the gas distributingdevice(s) and/or gas distributing surface(s). That is, the supply linecan be used to supply purge gas to a single input purge port for the gasdistributing device/gas distributing surface or used to supply purge gasalong multiple input purge ports for the gas distributing device/gasdistributing surface. The term “pipe” or “piping” means structures thatare used for distributing the flow of purge gas through the network ofgas distributing devices and includes pipes, piping, tubing, pathways,connectors, valves, controllers, and similar structures that can be usedfor setting/adjusting the flow of gas through the network of gasdistributing devices.

Also when used herein, while the terms “front” and “rear” and “right”and “left” are used to describe various elements, the elements are notlimited by these terms. Rather, the terms are only used to distinguishone element from another. Instead, the terms are interpreted broadly toinclude any positional relationship between the elements including, thefront, the back, the sides, the top, the bottom, or any combinationthereof without departing from the scope of the present disclosure.

As used in this specification and the appended claims, the singularforms “a”, “an”, and “the” include plural referents unless the contentclearly dictates otherwise. As used in this specification and theappended claims, the term “or” is generally employed in its senseincluding “and/or” unless the content clearly dictates otherwise.

The following detailed description should be read with reference to thedrawings in which similar elements in different drawings are numberedthe same. The detailed description and the drawings, which are notnecessarily to scale, depict illustrative embodiments and are notintended to limit the scope of the invention. The illustrativeembodiments depicted are intended only as exemplary. Selected featuresof any illustrative embodiment may be incorporated into an additionalembodiment unless clearly stated to the contrary.

This disclosure generally relates to a purge flow distribution systemfor a substrate container having a front opening for accessing aninterior space of the substrate container. More specifically, thisdisclosure relates to a purge flow distribution system configured todistribute a stream of purge gas into an interior space of the substratecontainer by dividing the stream of purge gas from a common source to aplurality of discrete input purge ports for supplying a network ofseparate gas distributing devices. In some embodiments, the purge flowdistribution system may be configured to prevent ingress of gas into thefront opening of the substrate container while open or as an outlet tofacilitate the exhaustion of purge gas from the substrate container whenthe substrate container is closed.

Substrates in the form of wafers can be processed to form semiconductordevices. A substrate container is a container for carrying thesubstrates during processing. The substrates can be stored within asubstrate container before and during the different process steps. Thesubstrate container is accessed through a front opening of the substratecontainer. The substrate container may be, for example, a front openingunified pod (FOUP). In an embodiment, the substrate container can be acontainer for a reticle, such as a reticle pod. In such an embodiment,the container body can be included as at least part of an outer podconfigured to contain an inner pod, with the purge flow distributionsystem including flow distribution system base being configured toprovide the purge gas to an interior space of the outer pod

FIGS. 1-2 show a substrate container 1 according to an embodiment of thedisclosure. FIG. 1 is a front perspective view of the substratecontainer 1, while FIG. 2 illustrates the substrate container with thedoor removed (e.g., opened). As shown in FIG. 1 , the substratecontainer 1 includes a front door 4 and a shell 6. The front door 4 isreceived within a front opening 12 of the shell 6, blocking the frontopening 12.

FIG. 2 illustrates the substrate container 1 with the front door 4removed (e.g., opened). As shown in FIG. 2 , the shell 6 defines theinterior space 8 of the substrate container, in which substrates arestored in the interior space 8 of the substrate container 1. Thesubstrate container 1 can be accessed by moving (e.g., opening,removing) the door 4. For example, the door 4 in FIG. 1 is received inthe shell 6 by inserting the door 4 into the shell 6. In an embodiment,one or more of the door 4 and the shell 6 can include a lockingmechanism (not shown) to prevent accidental removal of the door 4.

As further shown in FIG. 2 , the shell 6 includes a first side wall 14,a second side wall 16, a rear wall 18, and a top wall 20, and a bottomwall 22. The first side wall 14 is opposite to the second side wall 16,and the top wall 20 is opposite the bottom wall 22. The first side wall14 can be referred to as the left side while the second side wall 16 canbe referred to as the right side. The top wall 20 and bottom wall 22each extend between the first side wall 14 and the second side wall 16.The shell 6 includes a front edge extending between opposing walls. Thebottom wall 22 includes a front edge 24A that extends along the frontopening 12. The front edge 24A also extends between the first side wall14 and the second side wall 16 of the shell 6. The first side wall 14includes a front edge 24B that extends along the front opening 12. Thefront edge 24B of the first side wall 14 also extends between the topwall 20 and the bottom wall 22 of the shell 6. As shown in FIG. 2 , thefront edges 24A, 24B in an embodiment are each directly adjacent to thefront opening 12.

The substrate container 1 can include an equipment hookup 26 on the topwall 20 of the shell 6. In an embodiment, the equipment hookup 26 allowsa standard automated attachment (not shown) for moving the substratecontainer 1, such as but not limited to an automated arm, to beconnected to the substrate container 1. For example, the automated armmay be used to move the substrate container 1 between differentprocessing equipment. In an embodiment, the substrate container 1 mayinclude one or more handles (not shown) to allow a user (e.g., atechnician, etc.) to manually move the substrate container 1.

The substrate container 1 can include a plurality of shelves 28 forholding substrates (not shown) in the interior space 8. The portions ofthe shelves 28 on the second side wall 16 are obscured in FIG. 2 , whichhave a similar configuration to the portions on the shelves 28 on thefirst side wall 14 (e.g., slots in the substrate container). The shelves28 are sized to each hold a substrate (not shown) within the interiorspace 8. For example, the shelves 28 in an embodiment are sized to holda specific size of substrate (e.g., 150 mm wafers, 200 mm wafers, etc.).

The substrate container 1 can include on the bottom wall 22, a pluralityof inlet purge port(s) and/or outlet purge port(s) (e.g., 30A, 30B, 30C,etc. of FIG. 2 ) corresponding to inlet(s) and/or outlet(s) of thesubstrate container 1. The plurality of inlet purge port(s) (and outletpurge ports) can be connected to a purge flow distribution system, asfurther discussed below. The at least one outlet port can be providedfor discharging gas in the interior space 8 out of the substratecontainer 1 and can be disposed in the bottom wall between the inlet andthe second side wall. It is appreciated that the inlet purge port(s)and/or outlet purge port(s) can also be provided in different positionsalong the shell 6, e.g., in the rear wall 18, in which such embodiment,the inlet purge port and/or outlet purge port corresponds to the inletand outlet of the substrate container.

The substrate container 1 also includes at least one inlet, e.g., inletport, for receiving a stream of purge gas from a purge gas supplysystem. The purge gas supply system delivers purge gas which maygenerally be an inert gas. The purge gas can include, for example, butis not limited to, one or more of nitrogen, clean dry air (CDA), andextra clean dry air (xCDA).

In an embodiment, the inlet port is connected to the purge flowdistribution system for supplying the purge gas to the inlet purgeport(s) to distribute the purge gas into the interior space 8. When thesubstrate container 1 is open, the purge flow distribution system can beused to distribute the purge gas to the interior space 8 to reduceingress of the external environment (e.g., gas, particles, humidity,etc.) through the front opening 12 into the substrate container 1. Forexample, the supplied purge gas is configured to flow out from interiorspace 8 through the front opening 12, which helps minimize any inwardflows into the interior space 8 through the front opening 12.

Conversely, purge gas can continue to be supplied to the interior space8 of the substrate container 1 when the door 4 is received within thefront opening 12 and the substrate container 1 is closed. The purge gascan also be exhausted to the exterior of the substrate container 1through the purge flow distribution system, such as described hereinaccording to the various embodiments, which may serve as both an inletand an outlet or as an outlet only depending on the configuration anddesired application. A positive pressure of purge gas within theinterior space 8 creates a diffusion gradient facilitating the flow ofpurge gas from the interior space through the one or more outlets andout of the substrate container.

FIG. 3A schematically shows an embodiment of the purge flow distributionsystem 340. The purge flow distribution system 340 is connected to theinlet port 305 to receive the purge gas from the purge supply system.The purge flow distribution system 340 further includes a network ofseparate gas distributing devices 350 for distributing the stream ofpurge gas into the interior space 8. A supply line 360 connected to theinlet is used to divide the stream of purge gas to the network ofseparate gas distributing devices 350. For example, in an embodiment,the supply line includes at least a first flow path 360A that isconnected to a first gas distributing device 350A and at least a secondflow path 360B that is connected to a second gas distributing device350B. It is appreciated, however, that the supply line 360 can beseparated into any number of different flow paths, as necessary, for thepurging operation of the substrate container, e.g., an additional third,fourth, etc. flow path to supply the purge gas to separate and/or thesame gas distributing device(s) in the substrate container 1. That is,the supply line 360 is configured to receive the supply of purge gasfrom a common input port, e.g., a purge gas source, and divide thesupply of purge gas to a plurality of discrete input purge ports forsupplying a plurality of gas distributing devices 350.

The network of separate gas distributing devices includes a plurality ofseparate and distinct gas distributing devices 350 that are connectedtogether by the at least one supply line 360. Thus, the network ofseparate gas distributing devices includes the separate gas distributingdevices 350 and the associated piping that connect(s) the separatedistributing devices for the distribution of the purge gas flow to theinterior of the substrate container 1.

The gas distributing devices 350 are devices that are separate anddistinct devices from other gas distributing devices of the network, inwhich each gas distributing device includes at least one gasdistributing surface, and is a combination of any of the plurality ofgas distributing surface(s) 351A, 351B, 351C that are provided atcertain specific locations in the substrate container, e.g., a front gasdistributing device includes any and all of the gas distributingsurfaces 351A, 351B provided at the front of the substrate container.That is, the gas distributing device(s) is the combination of any or allof a plurality of gas distributing surface(s) provided a specificlocation of the substrate container, in which the gas distributingsurface is the structural part of the gas distributing device thatdistributes the portion of the purge gas from the gas distributingdevice into the interior space. It is appreciated that the gasdistributing surface 351A, 351B, 351C is connected to at least one inputpurge port and includes structure(s) for distributing the purge gas intothe interior space, for example, diffusers, manifolds, membranes,portions having slits or nozzles or is made of porous material, orsimilar structures that is able to direct the purge gas into theinterior of the substrate container, and combinations of the same.

For example, in an embodiment, the first gas distributing device 350A islocated at the rear section, e.g., nearer the rear wall 18, of the FOUPand can include at least one gas distributing surface(s) 351A, 351B, forexample, a first and/or second diffuser, that is connected to at leastone input purge port. The second gas distributing device 350B can belocated at the front section, e.g., nearer the front opening 12, of theFOUP and can include at least one gas distributing surface(s) 351C thatcomprises a plurality of openings arranged along a length of the gasdistributing surface between the first side wall and the second sidewall or that extends vertically along one of a front edge of the firstside wall or a front edge of the second side wall, e.g., a top/bottommanifold and/or a right/left manifold, that is connected to at least oneother input purge port. The supply line 360 is divided into a first flowpath 360A to supply at least a portion of the stream of purge gas to theinput purge port for the first gas distributing device 350A and into asecond flow path 360B to supply at least another portion of the streamof purge gas to the input purge port for the second gas distributingdevice 350B. It is appreciated that the first and second gasdistributing devices are not necessarily located at the rear and frontsections, but are provided by way of example, and can be provided atvarying (or the same) locations in the interior space of the substratecontainer.

The amount of the purge gas supplied to the first and second flow paths360A, 360B to supply the separate gas distributing devices 350A, 350Bcan be set in a number of ways. For example, in an embodiment, valvescan be provided in the supply line and set, e.g., setting the valve to apredetermined opening size, to divide the supply of purge gas to thefirst and second flow paths 360A, 360B to supply a predetermined amountof purge gas to the separate gas distributing devices 350A, 350B. Thevalves can include needle valves, ball valves, butterfly valves,non-return valves, or similarly structured valves that are used to setthe amount of flow of purge gas to the different and separate gasdistributing devices. It is appreciated that the amount of purge gas canalso be set using an orifice, spring loaded diverter, or having one ofthe first or second flow paths have piping/pipes that have smaller orlarger cross-sectional areas, as needed, to divide the supply of purgegas to the appropriate/predetermined amount to supply the gasdistributing device(s), e.g., the dividing/supplying of the purge gas isbased on differential pressure of the network. It is also appreciatedthat amount of purge gas can be set to each separate gas distributingsurface 351A, 351B, 351C. In other words, the supply of purge gas from asingle inlet port is divided and set so that the predetermined amount ofpurge gas is supplied to the plurality of discrete input purge ports forsupplying the gas distributing devices and/or gas distributing surfaces,respectively.

FIG. 3B illustrates another embodiment of the purge flow distributionsystem 340, in which the inlet includes at least two inlet ports 305Aand 305B. In the embodiment of FIG. 3B, the purge flow distributionsystem 340 is connected to both inlet ports 305A, 305B to receive thepurge gas from the purge gas supply system. The purge flow distributionsystem further includes a network of separate gas distributing devices350 for distributing the purge gas into the interior of the interiorspace 8. The supply line 360, however, in this embodiment is connectedto both inlet ports 305A and 305B so that the supply of purge gas iscombined and then divided into at least a first flow path 360A connectedto a first gas distributing device 350A and a second flow path 360B thatis connected to a second gas distributing device 350B. It is appreciatedthat the supply of purge gas can be mixed/combined from the joining ofthe piping of the supply line from the inlet ports 305A, 305B, or mixed,e.g., using an in-line mixer, and then divided/separated into thedifferent flow paths 360A, 360B. The first and second gas distributingdevices 350A, 350B each include at least one gas distributing surfacefor distributing the purge gas into the interior of the substratecontainer, as discussed above.

The amount of the purge gas supplied to the first and second flow paths360A, 360B to supply the separate gas distributing devices 350A, 350Bcan be set in a number of ways. For example, in an embodiment, valvescan be provided upstream and/or downstream of the mixing/combining ofthe supply of purge gas from the inlet ports 305A, 305B and set todivide the supply of purge gas into the predetermined amount of purgegas for the separate gas distributing devices 350A, 350B and/or theseparate gas distributing surfaces 351A, 351B, 351C. In other words, thesupply of purge gas from both inlet ports 305A, 305B is divided and setso that the predetermined amount of purge gas is supplied to theplurality of discrete input purge ports for supplying the separate gasdistributing devices and/or separate gas distributing surfaces,respectively.

FIG. 3C illustrates yet another embodiment of the purge flowdistribution system 340, in which the inlet includes at least two inletports 305A and 305B, where the inlet ports are separately used to supplydifferent networks of separate gas distributing devices. That is, thepurge flow distribution system 340 includes at least two networks ofseparate gas distributing devices 350 for distributing the stream ofpurge gas into the interior space 8. In this embodiment, the purge flowdistribution system 340 includes at least two separate supply lines 360,370 that are each connected separately to the inlet ports 305A and 305B.The first supply line 360 connected to inlet port 305A is used to dividethe supply of purge gas from inlet port 305A into at least a first flowpath 360A connected to a first gas distributing device 350A having gasdistributing surfaces 351A, 351B and a second flow path 360B that isconnected to a second gas distributing device 350B having at least onegas distributing surface 351C. The second supply line 370 connected toinlet port 305B is used to divide the supply of purge gas from the inletport 305B into at least a first flow path 370A connected to a third gasdistributing device 350C having at least two gas distributing surfaces351D, 351E and a second flow path 370B connected to a fourth gasdistributing device 350D having at least one gas distributing surface351F.

The amount of the purge gas supplied to the first and second flow pathsof the at least two networks of separate gas distributing devices tosupply the separate gas distributing devices 350A, 350B, 350C, 350D canbe set in a number of ways. For example, in an embodiment, valves can beprovided in the supply lines 360, 370 and set to divide the supply ofpurge gas into the predetermined amount of purge gas for the separategas distributing devices 350A, 350B, 350C, 350D and/or the separate gasdistributing surfaces 351A, 351B, 351C, 351D, 351E, 351F. In otherwords, the supply of purge gas from the inlet ports 305A, 305B are eachused separately to supply a respective supply line, where eachrespective supply line is used to divide and set the predeterminedamount of purge gas to be supplied to the plurality of discrete inputpurge ports for supplying the separate gas distributing devices.

It is appreciated that while FIGS. 3A-3C show that the supply line 360(or 370) is divided prior to supplying the separate gas distributingdevices, the supply line can be separated to any number of differentflow paths that can be used to supply purge gas separately to any of thegas distributing devices and/or the gas distributing surfaces, as longas the predetermined amount of purge gas flow can be set to be dividedand/or distributed to the respective gas distributing device, e.g.,equal amount of flow of purge gas to all of the gas distributing devicesin the network or more flow of purge gas to one of the gas distributingdevices, as necessary. It is also appreciated that the inlet ports canbe provided at different locations along the substrate container. Forexample, the bottom wall of the substrate container can include a rearinlet port for introducing the second stream of purge gas, in which therear inlet port is disposed nearer the rear wall than the front openingor the bottom wall can include a second inlet port for introducing asecond stream of purge gas, in which the second inlet port is disposednearer the front opening than the rear wall, or other location along thesubstrate container. In other embodiments, the inlet port(s) (and/oroutlet port) can be provided on the bottom wall of the substratecontainer in which if multiple inlet ports are provided, the purge gascan be combined before the purge gas is supplied to the purge flowdistribution system.

While the foregoing has been described with respect to a FOUP, it isappreciated that any of the embodiments discussed herein can also beused to distribute purge gas in an interior space within a reticle pod,for example, within an outer pod of a reticle pod.

For example, FIGS. 4A and 4B illustrate another embodiment in which thesupply line can be provided for dividing the supply of purge gas to theseparate gas distributing device(s) and/or separate gas distributingsurface(s). In the embodiment, the second flow path of the supply lineis provided after the first flow path.

FIG. 4A shows the rear side of substrate container 400. The shell 406defines the interior space 408 of the substrate container, in whichsubstrates (not shown) are stored in the interior space 408 of thesubstrate container 400. The shell 406 includes a first side wall 414, asecond side wall 416, a rear wall 418, and a top wall 420, and a bottomwall 422. The first side wall 414 is opposite to the second side wall416, and the top wall 420 is opposite the bottom wall 422. The firstside wall 414 can be referred to as the left side while the second sidewall 416 can be referred to as the right side. The top wall 420 andbottom wall 422 each extend between the first side wall 414 and thesecond side wall 416. The substrate container 400 can also include acarrier plate 423 which can provide a base that the shell 406 can beattached to.

The purge flow distribution system can be included in the shell 406 ofthe substrate container 400 or connected thereto, for example, betweenor at least partially disposed between the shell 406 and carrier plate423. The purge flow distribution system is connected to at least oneinlet port that is connected to a purge gas supply system for supplyingthe purge gas to the network of separate gas distributing devices. Thepurge flow distribution system includes at least one supply line that isconnected to at least one inlet purge port 430A, 430B on the bottom wall422. The supply line includes a first flow path 460A connected to theinlet purge ports 430A, 430B for supplying purge gas to the rear gasdistributing devices 450A, 450B, in which the rear gas distributingdevices can include at least two diffusers. The at least two diffusers450A, 450B include a plurality of openings for distributing the purgegas at the rear of the substrate container 400. At least one of the atleast two diffusers 450A, 450B of the rear gas distributing device alsoincludes an opening at a top end thereof that is nearer the top wall 420of the substrate container 400 forming an input purge port that isconnected to a second flow path 460B for supplying the purge gas toanother gas distributing device, e.g., a second gas distributing device.In this embodiment, the second flow path 460B is connected to a frontgas distributing device that includes at least one gas distributingsurface, for example, a top manifold 450C provided near the top wall 420of the substrate container 400.

As seen in FIG. 4B, the second flow path 460B includes a tubing,channel, or path provided along a top portion nearer the top wall 420 ofthe substrate container 400 for supplying at least a portion of thepurge gas supplied to the first flow path 460A to be distributed to thefront gas distributing device. For example, the amount of purge gas tothe front gas distributing device can be set by sizing thecross-sectional area of the second flow path 460B to have apredetermined amount of purge gas flow, e.g., in which flow isproportional to the cross-sectional area, and/or by setting the size,e.g., diameter, of the plurality of openings of the at least twodiffusers 450A, 450B so that a predetermined amount of purge gas issupplied through the second flow path 460B dependent on the supplypressure, e.g., pressure differential. That is, the first gasdistributing device is supplied with the purge gas to distribute apredetermined amount of purge gas through the openings of the diffusers450A, 450B, while the remaining amount of purge gas is supplied to thesecond gas distributing device via the second flow path 460B fordistributing the purge gas through the gas distributing surface(s) ofthe second (front) gas distributing device. It is appreciated that anyof the gas distributing surfaces, while described herein relate to a topmanifold and diffusers, can be any of the structures for distributingthe purge gas into the interior of the substrate container 400,including, but not limited to, top/bottom/side manifold(s),top/bottom/side diffusers, top/bottom/side membranes, top/bottom/sideportions having slits or nozzles or made of porous material. It is alsoappreciated that the supply line can also include valves or otherstructures for setting the amount of purge gas supplied to the first gasdistributing device and/or the second gas distributing device.

FIG. 5A illustrates another embodiment and shows the rear side ofsubstrate container 500. The shell 506 defines the interior space of thesubstrate container, in which substrates (not shown) are stored in theinterior space of the substrate container 500. The shell 506 includes afirst side wall 514, a second side wall 516, a rear wall 518, and a topwall 520, and a bottom wall 522. The first side wall 514 is opposite tothe second side wall 516, and the top wall 520 is opposite the bottomwall 522. The first side wall 514 can be referred to as the left sidewhile the second side wall 516 can be referred to as the right side. Thetop wall 520 and bottom wall 522 each extend between the first side wall514 and the second side wall 516. The substrate container 500 can alsoinclude a carrier plate 523 which can provide a base that the shell 506can be attached to.

The purge flow distribution system can be included in the shell 506 ofthe substrate container 500 or connected thereto, for example, betweenor at least partially disposed between the shell 506 and carrier plate523. The purge flow distribution system 540 is connected to at least oneinlet port 505 that is connected to a purge gas supply system forsupplying the purge gas to the network of separate gas distributingdevices. The purge flow distribution system 540 includes at least onesupply line that is connected to at least one purge port on the bottomwall 522. In this embodiment, the purge flow distribution system 540includes a manifold base 560 provided on the bottom wall 522 that isconfigured to divide the stream of purge gas to the network of gasdistributing devices.

As seen in FIG. 5B, the manifold base 560 is connected to the network ofseparate gas distributing devices 550. The manifold base 560 includes afirst flow path 560A connected to inlet purge port(s) for supplyingpurge gas to a first gas distributing device and a second flow path 560Bconnected to inlet purge port(s) for supplying purge gas to a second gasdistributing device. The first gas distributing device can be a rear gasdistributing device 550A that can include rear left and right diffusers550A and 550B and the second gas distributing device can be a front gasdistributing device that can include a front manifold 550C and left andright manifolds 550D and 550E for distributing the purge gas to theinterior of the substrate container at a front side of the substratecontainer. The purge flow distribution system 540 is configured in a waysuch that the supply line can be adjusted to set the amount of purge gasthat flows to at least one of the front gas distributing device and therear gas distributing device, and/or can also be set to adjust theamount of purge gas to the separate gas distributing surfaces of thefront gas distributing device and/or the rear gas distributing device.It is appreciated that the first and second gas distributing devices arenot necessarily located at the rear and front sections, but are providedby way of example, and can be provided at varying (or the same)locations in the interior space of the substrate container.

For example, in this embodiment, an inlet supply line valve 580 can beadjusted to set the amount of purge gas supplied to the front gasdistributing device and the rear gas distributing device. That is, byadjusting the supply line valve 580 a pressure differential can becreated to divide the supply of purge gas to the first flow path 560Aand the second flow path 560B to set the amount of purge gas supplied tothe front gas distributing device and the rear gas distributing devicethat is necessary for the purging of the substrate container.

In addition to controlling the amount of purge gas to the front gasdistributing device by setting the supply line valve 580, the amount ofpurge gas to the separate gas distributing surfaces 550C, 550D, 550E ofthe front gas distributing device can be adjusted using a plurality ofadjustable valves 585A, 585B, 585C, 585D. For example, adjustable valve585A can be set to control an amount of purge gas to the front right,e.g., right side, manifold 550E, adjustable valves 585B and 585C can beset to control an amount of purge gas to the front manifold 550C, andadjustable valve 585D can be set to control an amount of purge gas tothe front left, e.g., left side, manifold 550D. Thus, the manifold base560 can be used to divide the purge gas from the supply line to thenetwork of separate gas distributing devices and/or the separate gasdistributing surfaces by setting the adjustable valves 580, 585A, 585B,585C, 585D. In other words, the supply of purge gas from a single inletport is divided and set so that the predetermined amount of purge gas issupplied to the plurality of discrete input purge ports for supplyingthe separate gas distributing devices 550, respectively.

As seen in FIG. 5C, the inlet port(s) connected to the purge flowdistribution system 540 can be provided in a variety of locations. Forexample, while FIG. 5A generally shows that the inlet port 505 isprovided below the manifold base 560 for supplying the purge gas fromthe purge gas distribution system, it is appreciated that the purge gascan be supplied to a number of inlet port(s) (or outlet port(s)) 505A,505B, 505C, 505D provided through the carrier plate 523 depending on thenature of the application/docking arrangement for the substratecontainer. It is appreciated that the purge gas from the inlet ports505A, 505B, 505C, 505D can be combined before being supplied to manifoldbase 560 or provided/combined as necessary to supply different purgeflow distribution systems in the substrate container.

It is appreciated that the amount of purge gas can also be controlled orset using any combination of different structures that allow setting thepressure drop or flow rate based on the conservation of energy. Forexample, an orifice can be placed in either the first flow path and/orthe second flow path to create a pressure differential to set the amountof purge gas supplied to the front gas distributing device and/or therear gas distributing device and/or any of the separate gas distributingsurfaces. Alternatively, or in addition to such structure, thecross-sectional area of the various piping(s) of the first flow pathand/or the second flow path can be sized to set the amount of purge gasdivided between the front gas distributing device and the rear gasdistributing device and/or the gas distributing surfaces of the frontand rear gas distributing devices. Thus, the purge flow distributionsystem 540 is configured so that the purge gas can be divided andsupplied to the different gas distributing devices and/or gasdistributing surfaces by adjusting and/or setting the differentcomponents of the purge flow distribution system 540 in the appropriatemanner.

FIG. 6 shows an operational flow 600 for supplying purge flow to asubstrate container, according to at least one example embodiment.

The operational flow 600 may include one or more operations, actions, orfunctions depicted by one or more blocks 610, 620, 630, and 640.Although illustrated as discrete blocks, various blocks may be dividedinto additional blocks, combined into fewer blocks, or eliminated,depending on the desired implementation. As a non-limiting example, thedescription of the method 600, corresponding to the depiction thereof inFIG. 6 and performed by one or more of the apparatuses or componentsdescribed in the above embodiments, according to one or more exampleembodiments described herein, pertains to supplying purge flow in asubstrate container. The processing flow 600 can begin at block 610.

Block 610 may refer to supplying a stream of purge gas into an interiorof a container via inlet purge port(s) connected to a purge flowdistribution system disposed at least partly in the substrate container,which may be a wafer or reticle container (e.g., a FOUP or reticle pod).The stream of purge gas can include one or more of nitrogen, clean dryair (CDA), extra clean dry air (xCDA), gas for conditioning a containerenvironment, or any other suitable fluid. Block 610 may be followed byblock 620.

Block 620 may refer to dividing the purge gas to supply a network ofseparate gas distributing devices to distribute the stream of purge gasinto the interior space of the substrate container via a supply line ofthe purge flow distribution system. In an embodiment in block 630, thedividing of the purge gas includes splitting the supply line into afirst flow path to supply purge gas to at least one of the network ofgas distributing devices and a second flow path to supply purge gas toanother of the network of gas distributing devices. The amount of purgegas supplied to the first flow path and to the second flow path can bebased on a number of predetermined operating conditions. For example, inone embodiment, one or more sensors can be used to detect at least oneenvironmental condition in the interior of the substrate containerduring a predetermined period of time. The at least one environmentalcondition may include one or more of relative humidity (% RH), pressure(e.g., absolute pressure), oxygen levels, temperature, a measuredpresence of airborne molecular contaminant, a measured presence of oneor more volatile organic compounds, etc. Block 620/630 may be followedby block 640.

Block 640 may refer to setting a first portion or amount of the streamof purge gas to a first distributing device via the first flow path andsetting a second portion or amount of the purge gas to a second gasdistributing device via the second flow path based on the at least onedetected environmental condition during a predetermined period of time.

In at least one example embodiment, the amount of purge gas to the frontgas distributing device and/or the rear gas distributing device may beobtained or determined by, e.g., achieving a desired (predetermined, oroptimal) environmental response (e.g., inside the container). Thedesired environmental response may include adjusting one or more ofrelative humidity (% RH), oxygen levels, temperature, a measuredpresence of airborne molecular contaminant, and/or a measured presenceof one or more volatile organic compounds in the interior of thecontainer to a respective predetermined threshold level. The desiredenvironmental response may also include producing a desired pressure(e.g., absolute pressure) in the interior of the container. Theenvironmental response may be detected or measured by sensor(s) insidethe container and the detected data may be communicated to outside ofthe container, e.g., a controller.

The controller analyzes the environmental response(s) and determines theamount of purge gas to be supplied to the front gas distributing device(and/or the front gas distributing surfaces) and the rear gasdistributing device necessary to reach applicable operational scenarios.In an embodiment, the controller analyzing the environmental response(s)and determining the amount of purge gas to reach applicable operationalscenarios may be achieved via design of experiments (DOEs), a trainedneural network, modeling, etc.

The amount of purge gas supplied to the at least one front distributingdevice and/or the rear distributing device can be set by settingvalve(s) provided in the supply line of the purge flow distributionsystem. The valves can include needle valves, ball valves, butterflyvalves, non-return valves, or similarly structured valves that can beused to control the flow of gas to the different and separate gasdistributing devices. It is appreciated that the flow of purge gas canalso be set using an orifice, spring loaded diverter, or by sizing thepiping/pipes of one of the first or second flow paths to havecross-sectional areas to supply a predetermined amount of purge gasgiven the supply pressure for the division of the supply of purge gas,as necessary. In an embodiment, once the amount of purge gas supplied tothe network of gas distributing devices is set, the amount, e.g.,valves, of purge gas supplied is not further adjusted until necessary,e.g., passive control.

Aspects

Any of aspects 1-17 can be combined with any of aspects 18 and 19.

Aspect 1. A substrate container, comprising: a shell defining aninterior space, the shell including a front opening, a first side wall,a second side wall, a rear wall, and a bottom wall including a frontedge extending between the first side wall and the second side wallalong the front opening of the shell; and a purge flow distributionsystem configured to receive a stream of purge gas, the purge flowdistribution system comprising: an inlet configured to receive thestream of purge gas; and a network of separate gas distributing devicesfor distributing the stream of purge gas into the interior space,wherein the purge flow distribution system further comprises a supplyline connected to the inlet that is configured to divide the stream ofpurge gas to the network of separate gas distributing devices.

Aspect 2. The substrate container of aspect 1, wherein the supply linecomprises a first flow path to one of the network of separate gasdistributing devices and a second flow path to another of the network ofseparate gas distributing devices.

Aspect 3. The substrate container of aspect 2, wherein the one of thenetwork of gas distributing devices is a first gas distributing deviceprovided nearer the rear wall and the another of the network of gasdistributing devices is a second gas distributing device provided in theinterior space of the substrate container, and wherein the first flowpath is configured to supply a portion of the stream of purge gas to thefirst gas distributing device and the second flow path is configured tosupply another portion of the stream of purge gas to the second gasdistributing device.

Aspect 4. The substrate container of aspect 3, wherein the first flowpath of the supply line to the first gas distributing device has asmaller or larger cross-sectional area than the second flow path of thesupply line to the second gas distributing device or comprises anorifice, a spring loaded diverter, or valve to induce flow to the secondflow path of the supply line to the second gas distributing device.

Aspect 5. The substrate container of aspect 3, wherein the second flowpath is provided after the first flow path at an end of the first gasdistributing device opposite the inlet.

Aspect 6. The substrate container of aspect 6, wherein the second flowpath is provided at a top portion of the substrate container to supplythe purge gas to the second gas distributing device.

Aspect 7. The substrate container of aspect 6, wherein the second gasdistributing device comprises a gas distributing surface that comprisesa plurality of openings arranged along a length of the gas distributingsurface between the first side wall and the second side wall or whereinthe front gas distributing device comprises a gas distributing surfacethat extends vertically along one of a front edge of the first side wallor a front edge of the second side wall.

Aspect 8. The substrate container of any of aspects 1-3, wherein thepurge flow distribution system further comprises a manifold baseprovided on the bottom wall that receives the stream of purge gas fromthe inlet to divide the stream of purge gas to the network of gasdistributing device.

Aspect 9. The substrate container of aspect 8, wherein the manifold baseis configured to divide the second flow path into at least a left sidesecond flow path and a right side second flow path to supply the portionof the stream of purge gas to the second gas distributing device.

Aspect 10. The substrate container of aspect 9, wherein the manifoldbase comprises a plurality of adjustable valves to set at least one ofthe portion of the stream of purge gas to the first flow path to thefirst gas distributing device and the portion of stream of purge gas tothe second flow path to the second gas distributing device.

Aspect 11. The substrate container of any of aspects 1-9, wherein one ofthe network of gas distributing devices comprises a gas distributingsurface comprising porous material.

Aspect 12. The substrate container of any of aspects 1-11, wherein thepurge flow distribution system is attached to an inlet purge port in thebottom wall of the shell.

Aspect 13. The substrate container of any of aspects 1-12, wherein oneof the network of gas distributing devices includes a gas distributingsurface that comprises a plurality of openings arranged along a lengthof the gas distributing surface between the first side wall and thesecond side wall of the shell.

Aspect 14. The substrate container of any of aspects 1-13, furthercomprising: an outlet port for discharging gas from the interior space,the outlet port being disposed in the bottom wall between the inlet andthe second side wall.

Aspect 15. The substrate container of any of aspects 1-14, wherein thebottom wall includes a rear inlet port for introducing a second streamof purge gas into the interior space through the purge flow distributionsystem, the rear inlet port being disposed nearer the rear wall than thefront opening.

Aspect 16. The substrate container of any of aspects 1-14, wherein thebottom wall includes a second inlet port for introducing a second streamof purge gas into the interior space through the purge flow distributionsystem, the second inlet port being disposed nearer the front openingthan the rear wall.

Aspect 17. The substrate container of any of aspects 1-16, furthercomprising: a door configured to be received within the front openingdefined by the shell to enclose the interior space.

Aspect 18. The substrate container of any of aspects 1-17, wherein theinlet of the purge flow distribution system comprises a first inlet anda second inlet, wherein the supply line is configured to combine thestream of purge gas from the first inlet and the second inlet and thendivide the stream of purge gas to the network of separate gasdistributing devices.

Aspect 19. A method of purging a substrate container that is open,comprising: supplying, via an inlet port disposed in a wall of thesubstrate container, a stream of purge gas to an inlet of a purge flowdistribution system disposed at least partly within the substratecontainer; dividing, via a supply line of the purge flow distributionsystem, the purge gas to supply a network of separate gas distributingdevices for distributing the stream of purge gas into an interior spaceof the substrate container, wherein the supply line comprises a firstflow path to one of the network of gas distributing devices and a secondflow path to another of the network of gas distributing devices.

Aspect 20. The method of aspect 19, further comprising setting a firstportion of the stream of purge gas to a first gas distributing devicevia the first flow path and setting a second portion of the stream ofpurge gas to a second gas distributing device via the second flow path

Having thus described several illustrative embodiments of the presentdisclosure, those of skill in the art will readily appreciate that yetother embodiments may be made and used within the scope of the claimshereto attached. Numerous advantages of the disclosure covered by thisdocument have been set forth in the foregoing description. It will beunderstood, however, that this disclosure is, in many respect, onlyillustrative. Changes may be made in the details, particularly inmatters of shape, size, and arrangement of parts without exceeding thescope of the disclosure. The disclosure's scope is, of course, definedin the language in which the appended claims are expressed.

1-20. (canceled)
 21. A substrate container, comprising: a shell definingan interior space, the shell including a front opening, a first sidewall, a second side wall, a rear wall, and a bottom wall including afront edge extending between the first side wall and the second sidewall along the front opening of the shell; a purge flow distributionsystem positioned on the shell, the purge flow distribution systemconfigured to receive a stream of purge gas, wherein the purge flowdistribution system includes an inlet configured to receive the streamof purge gas; and at least one gas distributing device for distributingthe stream of purge gas into the interior space.
 22. The substratecontainer according to claim 21, wherein the gas distributing device isa diffuser, manifold, membrane, side portions of the shell having slitsor nozzles, a porous material, or a combination of at least two selectedfrom the foregoing.
 23. The substrate container according to claim 21,wherein the at least one gas distributing device further comprises anetwork of gas distributing devices.
 24. The substrate containeraccording to claim 23, wherein the one of the network of gasdistributing devices is a first gas distributing device provided nearerthe rear wall and another of the network of gas distributing devices isa second gas distributing device provided in the interior space of thesubstrate container, and wherein a first flow path is configured tosupply a portion of the stream of purge gas to the first gasdistributing device and a second flow path is configured to supplyanother portion of the stream of purge gas to the second gasdistributing device.
 25. The substrate container according to claim 24,wherein the first flow path to the first gas distributing device has asmaller or larger cross-sectional area than the second flow path to thesecond gas distributing device or comprises an orifice, a spring loadeddiverter, or valve to induce flow to the second flow path to the secondgas distributing device.
 26. The substrate container according to claim21, wherein the at least one gas distributing device comprises a gasdistributing surface that comprises a plurality of openings arrangedalong a length of the gas distributing surface.
 27. The substratecontainer according to claim 21, wherein the purge flow distributionsystem further comprises a manifold base provided on the bottom wall andpositioned on an exterior of the shell, the manifold base receives thestream of purge gas.
 28. The substrate container according to claim 27,wherein the manifold base is configured to divide the stream of purgegas into at least a left side flow path and a right side flow path tosupply the portion of the stream of purge gas to two or more gasdistributing devices.
 29. The substrate container according to claim 21,wherein the at least one gas distributing device comprises a gasdistributing surface having porous material.
 30. The substrate containerof claim 21, wherein the purge flow distribution system is attached toan inlet purge port in the bottom wall of the shell.
 31. The substratecontainer of claim 21, further comprising: an outlet port fordischarging gas from the interior space, the outlet port being disposedin the bottom wall between the inlet and the second side wall.
 32. Thesubstrate container of claim 21, wherein the bottom wall includes a rearinlet port for introducing a stream of purge gas into the interior spacefrom the purge flow distribution system, the rear inlet port beingdisposed nearer the rear wall than the front opening.
 33. The substratecontainer of claim 32, wherein the bottom wall includes a second inletport for introducing a second stream of purge gas into the interiorspace from the purge flow distribution system, the second inlet portbeing disposed nearer the front opening than the rear wall.
 34. Thesubstrate container of claim 21, further comprising: a door configuredto be received within the front opening defined by the shell to enclosethe interior space.
 35. A substrate container, comprising: a shelldefining an interior space, the shell including a front opening, a firstside wall, a second side wall, a rear wall, and a bottom wall includinga front edge extending between the first side wall and the second sidewall along the front opening of the shell; a manifold base positioned onthe shell, the manifold base having an inlet configured to receive astream of purge gas, and at least one diffuser in communication with themanifold base for distributing the stream of purge gas into the interiorspace of the shell.
 36. The substrate container of claim 35, wherein themanifold base is positioned between the shell and a carrier plate. 37.The substrate container of claim 35, wherein the at least one diffuseris positioned near the rear wall of the shell.
 38. The substratecontainer according to claim 35, wherein the diffuser comprises a gasdistributing surface having porous material.